- With maximum uniformity, superior gas and RF distribution, a proprietary controlling software and compliance to CE and SEMI international standards, our plasma cleaning and etching systems are ideal for all applications where process reliability and repeatability are a must.
Categories: Electrical & Electronics, Plasma Cleaning & Etching System, Production Equipment, SCI Plasma, Semiconductor
Quadrio α is a compact standalone plasma cleaning system suitable for substrates with a strip form factor.
Capable of performing PE and RIE processes, the Quadrioα provides high uniformity reliable results with a competitive throughput.
Product Features:
Quadrio α comes in two versions:
- Quadrioα 4 with 4 tracks, 400 UPH*
- Quadrioα 5 with 5 tracks, 500 UPH*
